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Contact usThe unique horizontal machining unit structure achieves high rigidity and low thermal displacement. Stable high flatness can be achieved in continuous grinding of silicon wafers. It can also be used for machining with a high number of grinding wheels and for machining difficult-to-machine materials.
By locally connecting the main unit of the surface grinder to a PC for data collection, trends such as grinding wheel wear, chuck adsorption pressure, grinding water volume, and motor current can be analyzed, contributing to stable production of wafers. The communication protocol is SEMI standard (GEM) compliant. Communication of processing data is possible through a network connection with a host PC. OHT (Over Head Transfer) workpiece loading is supported, enabling unmanned processing from workpiece delivery to processing.
Ductile mode grinding is realized by adopting air hydrostatic pressure for the grinding wheel and chuck spindle, high loop rigidity, and nano-level micro feed. This enables low-damage grinding of wafers and reduces the load on the polishing process.